Grating Foundry Service
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Holographic exposure
This production technology employs widely used 2-beam intereferometric patterning on an optical table, but spiced with the features of Ibsen's unique know-how:
- 100% Class 10 cleanroom envirnoment
- Grating period accuracy and uniformity of +/- 0.01 nm
- Substrate / wafer size capabilities up to 6" (150 mm)
- Grating area definition possibilities
- RIE etching services can also be combined with the grating patterning service
NFH Grating Foundry Services
Ibsen has worked extensively with NFH, and offers grating foundry services by NFH on our Suss MA6 NFH mask Aligner. NFH is especially applicable to patterning very short grating periods (200 nm -600 nm) over large areas. Contact us to discuss your requirements and our capabilities.
Holographic Stepper Grating Foundry Services
For patterning of grating chip areas on wafers, Ibsen has developed proprietary holographic stepper patterning technology that is used for own grating production. Ibsen offers grating foundry services on this technology. A couple samples of gratings patterned in photoresist are shown below:
Grating SEM, Photoresist on Si, 350 nm period
Grating SEM, Photoresist on SiO2, 1000 nm period
Further Information and Ordering
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Ibsen Photonics releases a new 1310 nm, high-resolution I-MON
